Manufacturing system of semiconductors support an information-oriented society. The key player, the semiconductor lithography equipment, uses extreme short wavelength vacuum ultraviolet lasers (ArF laser, KrF laser) to draw fine circuits. Since these lasers have a short wavelength and very high energy density, CaF2 with much higher laser durability is used rather than quartz.
We offer the excimer laser grade CaF2 product with high optical transmittance and durability as optical material for lasers, suitable for semiconductor lithography equipment.
Semiconductor lithography equipment, window material for lasers in the ultraviolet region
* CaF2 products for the usual ultraviolet (UV) region are also available. Please feel free to inquire.
(in a vacuum)
|Refractive index for nitrogen
Accuracy of measurement
194.227nm, 184.950nm ±5×10-6
Transmittance is nearly unchanged even after applying an ArF excimer laser.
22℃, 1013.25hPa, in nitrogen